Applications:

• Photoresist and protective buffer layers for semiconductors chips. (DRAM, Flash memory, CPU, TFT)

Microlithography

• Transistors, wiring etc. can fabricated on Si wafer.

Photoacid Generators for
Chemically Amplified i-line, g-line, KrF and ArF Photoresists:
Brochure (2006, PDF) & Flyer (2006, PDF)

• IRGACURE PAG 103 (i-line)
• IRGACURE PAG 108 (i-line)
• IRGACURE PAG 121 (i-line
• IRGACURE PAG 203 (KrF)

Pre-commercial products

• CGI 1906 (ArF & ArF Immersion)
• CGI 1907 (ArF & ArF Immersion)
• CGI MDT (N-Hydroxy-5-norbornene-2,3-Dicarboximide Trifluromethane sulfonate)
• CGI-PNBT (4-nitrobenyzl tosylate)
• CGI-NIT (N-Hydroxynaphthalimide triflate)
• CGI 725 (i-line)

Photoinitiators for polyimide (PSPI)

• IRGACURE® 727
• IRGACURE® 784

Polymers and ancilliaries

• 9-anthacenemethyl methacrylate
• Glycoluril crosslinkers
  CGPS 352
  CGPS 318